New Trends and Developments in Metrology

Author: Luigi Cocco

Publisher: BoD – Books on Demand

ISBN: 9535124773

Category: Technology & Engineering

Page: 292

View: 2326

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Investigating the incessant technology growth and the even higher complexity of engineering systems, one of the crucial requirements to confidently steer both scientific and industrial challenges is to identify an appropriate measurement approach. A general process can be considered effective and under control if the following elements are consciously and cyclically managed: numeric target, adequate tools, output analysis, and corrective actions. The role of metrology is to rigorously harmonize this virtuous circle, providing guidance in terms of instruments, standards, and techniques to improve the robustness and the accuracy of the results. This book is designed to offer an interdisciplinary experience into the science of measurement, not only covering high-level measurement strategies but also supplying analytical details and experimental setups.
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New Trends and Developments in Automotive System Engineering

Author: Marcello Chiaberge

Publisher: BoD – Books on Demand

ISBN: 9533075171

Category: Technology & Engineering

Page: 680

View: 5810

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In the last few years the automobile design process is required to become more responsible and responsibly related to environmental needs. Basing the automotive design not only on the appearance, the visual appearance of the vehicle needs to be thought together and deeply integrated with the power developed by the engine. The purpose of this book is to try to present the new technologies development scenario, and not to give any indication about the direction that should be given to the research in this complex and multi-disciplinary challenging field.
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New Trends in Lasers and Electro-optics Research

Author: William T. Arkin

Publisher: Nova Publishers

ISBN: 9781600214745

Category: Technology & Engineering

Page: 295

View: 974

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It is expected that on going advances in optics will revolutionise the 21st century as they began doing in the last quarter of the 20th. Such fields as communications, materials science, computing and medicine are leaping forward based on developments in optics. This series presents leading edge research on optics and lasers from researchers spanning the globe.
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Metrology and Diagnostic Techniques for Nanoelectronics

Author: Zhiyong Ma,David G. Seiler

Publisher: CRC Press

ISBN: 135173394X

Category: Science

Page: 1454

View: 1218

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Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.
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Information Modeling for Interoperable Dimensional Metrology

Author: Y Zhao,T Kramer,Robert Brown,Xun Xu

Publisher: Springer Science & Business Media

ISBN: 9781447121671

Category: Technology & Engineering

Page: 367

View: 5296

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Dimensional metrology is an essential part of modern manufacturing technologies, but the basic theories and measurement methods are no longer sufficient for today's digitized systems. The information exchange between the software components of a dimensional metrology system not only costs a great deal of money, but also causes the entire system to lose data integrity. Information Modeling for Interoperable Dimensional Metrology analyzes interoperability issues in dimensional metrology systems and describes information modeling techniques. It discusses new approaches and data models for solving interoperability problems, as well as introducing process activities, existing and emerging data models, and the key technologies of dimensional metrology systems. Written for researchers in industry and academia, as well as advanced undergraduate and postgraduate students, this book gives both an overview and an in-depth understanding of complete dimensional metrology systems. By covering in detail the theory and main content, techniques, and methods used in dimensional metrology systems, Information Modeling for Interoperable Dimensional Metrology enables readers to solve real-world dimensional measurement problems in modern dimensional metrology practices.
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Plasma Source Mass Spectrometry

Current Trends and Future Developments

Author: Royal Society of Chemistry (Great Britain)

Publisher: Royal Society of Chemistry

ISBN: 0854046631

Category: Science

Page: 356

View: 1443

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The current state of practical ICP-MS and the latest developments in the field.
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Precision Assembly Technologies and Systems

7th IFIP WG 5.5 International Precision Assembly Seminar, IPAS 2014, Chamonix, France, February 16-18, 2014, Revised Selected Papers

Author: Svetan Ratchev

Publisher: Springer

ISBN: 3662455862

Category: Computers

Page: 171

View: 6592

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This book constitutes the refereed post-proceedings of the 7th IFIP WG 5.5 International Precision Assembly Seminar, IPAS 2014, held in Chamonix, France, in February 2014. The 20 revised full papers were carefully reviewed and selected from numerous submissions. The papers cover the following topics: micro-assembly processes and systems ranging from desktop factory automation and packaging of MEMS to self-assembly processes and platforms; handling and manipulation, including flexible gripper systems, fixturing and high precision actuators; tolerance management and error-compensation techniques applied at different scales of precision assembly; metrology and quality control; intelligent assembly control; process selection, modelling and planning.
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Optical Imaging and Metrology

Advanced Technologies

Author: Wolfgang Osten,Nadya Reingand

Publisher: John Wiley & Sons

ISBN: 3527648461

Category: Science

Page: 502

View: 4225

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A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.
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