Handbook of Advanced Plasma Processing Techniques

Handbook of Advanced Plasma Processing Techniques

This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics.

Author: R.J. Shul

Publisher: Springer Science & Business Media

ISBN: 9783642569890

Category: Technology & Engineering

Page: 655

View: 427

Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Categories: Technology & Engineering

Handbook of Plasma Processing Technology

Handbook of Plasma Processing Technology

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

Author: Stephen M. Rossnagel

Publisher: William Andrew

ISBN: 0815512201

Category: Reference

Page: 523

View: 206

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Categories: Reference

III V Integrated Circuit Fabrication Technology

III V Integrated Circuit Fabrication Technology

R. J. Shul and S. J. Pearton, Handbook of Advanced Plasma Processing Techniques, books.google.com (2000). S.J. Pearton, U. K. Chakrabarty and W. S. Hobson, ...

Author: Shiban Tiku

Publisher: CRC Press

ISBN: 9789814669313

Category: Science

Page: 550

View: 775

GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III–V processing, with emphasis on HBTs. It is aimed at practicing engineers and graduate students and engineers new to the field of III–V semiconductor IC processing. The book’s primary purpose is to discuss all aspects of processing of active and passive devices, from crystal growth to backside processing, including lithography, etching, and film deposition.
Categories: Science

Encyclopedia of Plasma Technology Two Volume Set

Encyclopedia of Plasma Technology   Two Volume Set

Reactive ion etching end-point determination by plasma impedance ... Shul, R.J.; Pearton, S.J., Eds. Handbook of Advanced Plasma Processing Techniques; ...

Author: J. Leon Shohet

Publisher: CRC Press

ISBN: 9781000031706

Category: Technology & Engineering

Page: 1656

View: 895

Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Categories: Technology & Engineering

Handbook of Advanced Semiconductor Technology and Computer Systems

Handbook of Advanced Semiconductor Technology and Computer Systems

A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit.

Author: Guy Rabbat

Publisher: Springer

ISBN: 9401170584

Category: Science

Page: 942

View: 823

Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems from the intro duction of plasma energy to the CVD environment, which makes it possible to promote chemical reactions at relatively low temperatures. A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit. This chapter discusses the PECVD technique and its ap plication to the deposition of dielectric, semiconductor, and conductor films of interest to microelectronics. Chapter 2 acquaints the reader with the technology and capabilities of plasma processing. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development. Requirements of anisotropic and selective etching have been met using a variety of reactor configurations and etching gases. The present emphasis is the integration of plasma etching processes into the overall fabrication sequence. Chapter 3 reviews recent advances in high pressure oxidation technology and its applications to integrated circuits. The high pressure oxidation system, oxi dation mechanisms, oxidation-induced stacking faults, impurity segregation, and oxide quality are described. Applications to bipolar and MOS devices are also presented.
Categories: Science

Gallium Oxide

Gallium Oxide

Technology, Devices and Applications Stephen Pearton, Fan Ren, Michael Mastro ... S.J. Pearton (Eds.), Handbook of Advanced Plasma Processing Techniques, ...

Author: Stephen Pearton

Publisher: Elsevier

ISBN: 9780128145227

Category: Technology & Engineering

Page: 507

View: 708

Gallium Oxide: Technology, Devices and Applications discusses the wide bandgap semiconductor and its promising applications in power electronics, solar blind UV detectors, and in extreme environment electronics. It also covers the fundamental science of gallium oxide, providing an in-depth look at the most relevant properties of this materials system. High quality bulk Ga2O3 is now commercially available from several sources and n-type epi structures are also coming onto the market. As researchers are focused on creating new complex structures, the book addresses the latest processing and synthesis methods. Chapters are designed to give readers a complete picture of the Ga2O3 field and the area of devices based on Ga2O3, from their theoretical simulation, to fabrication and application. Provides an overview of the advantages of the gallium oxide materials system, the advances in in bulk and epitaxial crystal growth, device design and processing Reviews the most relevant applications, including photodetectors, FETs, FINFETs, MOSFETs, sensors, catalytic applications, and more Addresses materials properties, including structural, mechanical, electrical, optical, surface and contact
Categories: Technology & Engineering

Microoptics and Nanooptics Fabrication

Microoptics and Nanooptics Fabrication

G.A. Vawter, Ion beam etching of compound semiconductors, in Handbook of Advanced Plasma Processing Techniques, R.J. Shul and S.J. Pearton (eds.) ...

Author: Shanalyn Kemme

Publisher: CRC Press

ISBN: 9781420019148

Category: Technology & Engineering

Page: 232

View: 344

The deep interconnection between micro/nanooptical components and related fabrication technologies—and the constant changes in this ever-evolving field—means that successful design depends on the engineer’s ability to accommodate cutting-edge theoretical developments in fabrication techniques and experimental realization. Documenting the state of the art in fabrication processes, Microoptics and Nanooptics Fabrication provides an up-to-date synopsis of recent breakthroughs in micro- and nanooptics that improve key developmental processes. This text elucidates the precise and miniaturized scale of today’s fabrication methods and their importance in creating new optical components to access the spectrum of physical optics. It details successful fabrication techniques and their direct effect on the intended performance of micro- and nanooptical components. The contributors explore the constraints related to material selection, component lateral extent, minimum feature size, and other issues that cause fabrication techniques to lag behind corresponding theory in the development process. Written with the professional optical engineer in mind, this book omits the already well-published broader processing fundamentals. Instead it focuses on key tricks of the trade helpful in reformulating processes to achieve necessary optical targets, improve process fidelity, and reduce production costs. The contributing authors represent the vanguard in micro-optical fabrication. The result of their combined efforts, this searing analysis of emerging fabrication technologies will continue to fuel the expansion of optics components, from the microwave to the infrared through the visible regime.
Categories: Technology & Engineering

MOEMS

MOEMS

W. Lang , “ Silicon microstructuring technology , ” Mater . ... R. J. Shul , J. G. Fleming , in Handbook of Advanced Plasma Processing Techniques , ( R. J. ...

Author: M. Edward Motamedi

Publisher: SPIE Press

ISBN: 0819450219

Category: Technology & Engineering

Page: 614

View: 299

This book introduces the exciting and fast-moving field of MOEMS to graduate students, scientists, and engineers by providing a foundation of both micro-optics and MEMS that will enable them to conduct future research in the field. Born from the relatively new fields of MEMS and micro-optics, MOEMS are proving to be an attractive and low-cost solution to a range of device problems requiring high optical functionality and high optical performance. MOEMS solutions include optical devices for telecommunication, sensing, and mobile systems such as v-grooves, gratings, shutters, scanners, filters, micromirrors, switches, alignment aids, lens arrays, and hermetic wafer-scale optical packaging. An international team of leading researchers contributed to this book, and it presents examples and problems employing cutting-edge MOEM devices. It will inspire researchers to further advance the design, fabrication, and analysis of MOEM systems.
Categories: Technology & Engineering

Micro Electro Mechanical System Design

Micro Electro Mechanical System Design

R.J. Shul, S.J. Pearton, Handbook of Advanced Plasma Processing Techniques, Springer–Verlag, New York, 2000. 6. U.S. Patent 5,501,893: Method of ...

Author: James J. Allen

Publisher: CRC Press

ISBN: 9781420027754

Category: Technology & Engineering

Page: 496

View: 897

It is challenging at best to find a resource that provides the breadth of information necessary to develop a successful micro electro mechanical system (MEMS) design. Micro Electro Mechanical System Design is that resource. It is a comprehensive, single-source guide that explains the design process by illustrating the full range of issues involved,
Categories: Technology & Engineering

Nanowires

Nanowires

Handbook of advanced Plasma Processing Techniques, Springer, ISBN 978-3-540-66772-8, Berlin, Germany Smit M. K. & Dam C. V. (1996).

Author: Abbass A. Hashim

Publisher: BoD – Books on Demand

ISBN: 9789533073279

Category: Science

Page: 566

View: 491

Understanding and building up the foundation of nanowire concept is a high requirement and a bridge to new technologies. Any attempt in such direction is considered as one step forward in the challenge of advanced nanotechnology. In the last few years, InTech scientific publisher has been taking the initiative of helping worldwide scientists to share and improve the methods and the nanowire technology. This book is one of InTechs attempts to contribute to the promotion of this technology.
Categories: Science

Fabrication of GaAs Devices

Fabrication of GaAs Devices

... these processes are and will remain the basis of most III - V device fabrication . ... S.J. Pearton [ Handbook of Advanced Plasma Processing Techniques ...

Author: Albert G. Baca

Publisher: IET

ISBN: 0863413536

Category: Technology & Engineering

Page: 350

View: 704

This book provides fundamental and practical information on all aspects of GaAs processing and gives pragmatic advice on cleaning and passivation, wet and dry etching and photolithography. Other topics covered include device performance for HBTs (Heterojunction Bipolar Transistors) and FETs (Field Effect Transistors), how these relate to processing choices, and special processing issues such as wet oxidation, which are especially important in optoelectronic devices. This book is suitable for both new and practising engineers.
Categories: Technology & Engineering

Semiconductor Manufacturing Handbook

Semiconductor Manufacturing Handbook

Handbook of Advanced Plasma Processing Techniques (Springer-Verlag, Berlin, 2000). Niggebrügge, U., M. Klug, and G. Garus, Inst. Phys. Conf. Ser.

Author: Hwaiyu Geng

Publisher: McGraw Hill Professional

ISBN: 9780071469654

Category: Technology & Engineering

Page: 800

View: 134

This handbook will provide engineers with the principles, applications, and solutions needed to design and manage semiconductor manufacturing operations. Consolidating the many complex fields of semiconductor fundamentals and manufacturing into one volume by deploying a team of world class specialists, it allows the quick look up of specific manufacturing reference data across many subdisciplines.
Categories: Technology & Engineering

Handbook of Advanced Radioactive Waste Conditioning Technologies

Handbook of Advanced Radioactive Waste Conditioning Technologies

waste from dismantling, 182–8 electrical cutting techniques, ... 222 supercompaction process, 212 geopolymers development, 207–25 future work, ...

Author: Michael I Ojovan

Publisher: Elsevier

ISBN: 9780857090959

Category: Technology & Engineering

Page: 512

View: 407

Radioactive wastes are generated from a wide range of sources, including the power industry, and medical and scientific research institutions, presenting a range of challenges in dealing with a diverse set of radionuclides of varying concentrations. Conditioning technologies are essential for the encapsulation and immobilisation of these radioactive wastes, forming the initial engineered barrier required for their transportation, storage and disposal. The need to ensure the long term performance of radioactive waste forms is a key driver of the development of advanced conditioning technologies. The Handbook of advanced radioactive waste conditioning technologies provides a comprehensive and systematic reference on the various options available and under development for the treatment and immobilisation of radioactive wastes. The book opens with an introductory chapter on radioactive waste characterisation and selection of conditioning technologies. Part one reviews the main radioactive waste treatment processes and conditioning technologies, including volume reduction techniques such as compaction, incineration and plasma treatment, as well as encapsulation methods such as cementation, calcination and vitrification. This coverage is extended in part two, with in-depth reviews of the development of advanced materials for radioactive waste conditioning, including geopolymers, glass and ceramic matrices for nuclear waste immobilisation, and waste packages and containers for disposal. Finally, part three reviews the long-term performance assessment and knowledge management techniques applicable to both spent nuclear fuels and solid radioactive waste forms. With its distinguished international team of contributors, the Handbook of advanced radioactive waste conditioning technologies is a standard reference for all radioactive waste management professionals, radiochemists, academics and researchers involved in the development of the nuclear fuel cycle. Provides a comprehensive and systematic reference on the various options available and under development for the treatment and immobilisation of radioactive wastes Explores radioactive waste characterisation and selection of conditioning technologies including the development of advanced materials for radioactive waste conditioning Assesses the main radioactive waste treatment processes and conditioning technologies, including volume reduction techniques such as compaction
Categories: Technology & Engineering

Advanced Topics in Materials Science and Engineering

Advanced Topics in Materials Science and Engineering

VIII.2 Plasma Enhanced Processes As described earlier, the ECR plasma ... Handbook of Plasma Processing Technology, (Noyes Publications, New Jersey, 1989).

Author: J.L. Morán-López

Publisher: Springer Science & Business Media

ISBN: 9781461528425

Category: Science

Page: 356

View: 850

This volume contains the papers presented at the First Mexico-U.S.A. Symposium on Materials Sciences and Engineering held in Ixtapa, Guerrero, Mexico, during Septem ber 24-27, 1991. The conference was conceived with the primary objective of increas ing the close ties between scientists and engineers in both Mexico and the U.S. with an interest in materials. The conference itself would have not taken place without the drive, determination and technical knowledge of John K. Tien of the University of Texas at Austin and of Francisco Mejia Lira of the Universidad de San Luis Potosi. This book is dedicated to their memory. The event brought together materials scientists and engineers with interests in a broad range of subjects in the processing, characterization and properties of advanced materials. Several papers were dedicated to structural materials ranging from ferrous alloys to intemetallics, ceramics and composites. The presentation covered properties, processing, and factors that control their use, such as fatigue and corrosion. Other materials and properties were also explored by U.S. and Mexican participants. Sev eral papers dealt with the characterization and properties of magnetics, optical and superconductor materials, nanostructured materials, as well as with computational and theoretical aspects likely to impact future materials research and development.
Categories: Science

Micromachining Technology for Micro optics and Nano optics V and Microfabrication Process Technology XII

Micromachining Technology for Micro optics and Nano optics V and Microfabrication Process Technology XII

With this multiplexed process , we produce high aspect ratio nanoscale ... and MEMS Processing " , Handbook of Advanced Plasma Processing Techniques , R. J. ...

Author: Mary Ann Perez-Maher

Publisher: Society of Photo Optical

ISBN: UOM:39015069219049

Category: Technology & Engineering

Page: 370

View: 497

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Categories: Technology & Engineering

Micromachining and Microfabrication Process Technology

Micromachining and Microfabrication Process Technology

K.P. Giapis , Fundamentals of Plasma Process - Induced Charging and Damage in Handbook of Advanced Plasma Processing Techniques , R.J. Shul and S.J. Pearton ...

Author:

Publisher:

ISBN: UOM:39015058298848

Category: Micromechanics

Page:

View: 159

Categories: Micromechanics

Handbook of Advanced Ceramics

Handbook of Advanced Ceramics

This new handbook will be an essential resource for ceramicists.

Author:

Publisher: Academic Press

ISBN: 9780123854704

Category: Technology & Engineering

Page: 1258

View: 638

This new handbook will be an essential resource for ceramicists. It includes contributions from leading researchers around the world and includes sections on Basic Science of Advanced Ceramics, Functional Ceramics (electro-ceramics and optoelectro-ceramics) and engineering ceramics. Contributions from more than 50 leading researchers from around the world Covers basic science of advanced ceramics, functional ceramics (electro-ceramics and optoelectro-ceramics), and engineering ceramics Approximately 750 illustrations
Categories: Technology & Engineering

Handbook of Advanced Industrial and Hazardous Wastes Management

Handbook of Advanced Industrial and Hazardous Wastes Management

Solid restaurant waste can be reduced through food recovery techniques ... and plasma processes), and hydrogen by fermentation (biohydrogen production).

Author: Lawrence K. Wang

Publisher: CRC Press

ISBN: 9781351643689

Category: Science

Page: 1174

View: 577

This volume provides in-depth coverage of environmental pollution sources, waste characteristics, control technologies, management strategies, facility innovations, process alternatives, costs, case histories, effluent standards, and future trends in waste treatment processes. It delineates methodologies, technologies, and the regional and global effects of important pollution control practices. It focuses on specific industrial and manufacturing wastes and their remediation. Topics include: heavy metals, electronics, chemical, and textile manufacturing.
Categories: Science

Handbook of Advanced Approaches Towards Pollution Prevention and Control

Handbook of Advanced Approaches Towards Pollution Prevention and Control

In general, “wet” anaerobic digestion techniques are used to treat urban wastewater in well-developed systems. The digestion process generates biogas and ...

Author: Rehab O Abdel Rahman

Publisher: Elsevier

ISBN: 9780128221693

Category: Science

Page: 334

View: 269

Handbook of Advanced Approaches towards Pollution Prevention and Control, Volume Two: Legislative Measures and Sustainability for Pollution Prevention and Control condenses all relevant information on pollution prevention and control in a single source. This handbook (Volume Two of Two) covers the principals of pollution prevention and control technologies, recent advances in pollution prevention, control technologies and their sustainability, modernization in pollution prevention and control technologies for future and next generation of pollution prevention and control technologies. The book is an indispensable resource for researchers and academic staff in chemical and process engineering, safety engineering, environmental engineering, biotechnology, and materials engineering. Provides in-depth information on the principles and advances in pollution prevention and control practices Discusses emerging technologies and processes for advanced pollution prevention and control Presents developments on the use of the assessment models as tools to support the research and applications of different technologies and processes Provides history, fundamentals, state-of-the-art, and future trends Edited by expert team of world-class editors
Categories: Science